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CLEANTHROUGH KS-2010半導(dǎo)體工藝清潔劑

CLEANTHROUGH KS-2010半導(dǎo)體工藝清潔劑

2022-09-29 16:56:53  

CLEANTHROUGH KS-2010半導(dǎo)體工藝清潔劑含高純度潤濕滲透劑,不含金屬離子和顆粒。CLEANTHROUGH KS-2010和SC1半導(dǎo)體清洗作用一樣(SC1清洗液是氨水、雙氧水以及水的混合物,三者體積比例為1:2:50。),但是不含危險品。

CLEANTHROUGH KS-2010半導(dǎo)體工藝清潔劑含高純度潤濕滲透劑,不含金屬離子和顆粒。CLEANTHROUGH KS-2010和SC1半導(dǎo)體清洗作用一樣(SC1清洗液是氨水、雙氧水以及水的混合物,三者體積比例為1:2:50。),但是不含危險品。

Product Specification

Product name:CLEANTHROUGH KS-2010


Appearance:Liquid


Specific gravity(20°C):1.03(25℃)


pH:3.8(25℃)


Applications:Promote of effect of various chemicals like SC-1


Properties

Cleaner for Semiconductor Processes. High purified wetting and penetrating agent without metal ions and particles.


標(biāo)簽: CLEANTHROUGH KS-2010